Prof. David N. Ruzic has been promoted to the grade of Fellow in the International Society for Optics and Photonics (SPIE).
Serving more than 264,000 constituents internationally, SPIE’s mission is to advance emerging, light-based technologies through information exchange, continuing education, publications, patent precedent, and career and professional growth. This year, SPIE has promoted 88 new Fellows to the society. Fellows are Members of distinction who have made significant scientific and technical contributions in the multidisciplinary fields of optics, photonics, and imaging. They are honored for their technical achievement and for their service to the general optics community and to SPIE in particular.
Ruzic’s connection to SPIE has been through his research and development of extreme ultraviolet lithography, a technology important to semiconductor manufacturing. Ruzic has been an invited speaker at the organization’s conference on Advanced Lithography since the conferences’ creation. He and his students have published extensively in SPIE-related journals and conference proceedings.
A member of the Nuclear, Plasma, and Radiological Engineering faculty the past 34 years, Ruzic has studied EUV lithography as part of the work of the Center for Plasma-Material Interactions, which he directs on the University of Illinois at Urbana-Champaign campus. Ruzic’s interests also include plasma-material interactions, liquid metals for fusion, etching and deposition for plasma processing, atmospheric-pressure plasmas for cleaning, adhesion, and film deposition; and magnetron sputtering applications.
In addition to his becoming a Fellow in SPIE, Ruzic also is a Fellow of the American Nuclear Society (ANS), the American Vacuum Society (AVS), and the American Physical Society (APS).
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