The Grainger College of Engineering
Nuclear, Plasma & Radiological Engineering

Brian Edward Jurczyk

Brian Edward Jurczyk
Brian Edward Jurczyk
Adjunct Research Assistant Professor

For More Information

Education

  • Ph.D. Nuclear, Plasma, and Radiological Engineering Univ. of Illinois 2001
  • MBA Technology Commercialization Univ. of Illinois, Urbana 2000
  • M.S. Nuclear Engineering Univ. of Illinois, Urbana 1997
  • B.S. Aeronautical and Astronautical Engineering Univ. of Illinois, Urbana 1995

Academic Positions

  • Post-Doctoral Research Associate, University of Illinois at Urbana-Champaign, 2003
  • Research Engineer, University of Illinois at Urbana-Champaign, 2004-2005
  • Adjunct Research Assistant Professor, February 2007 - present

Other Professional Employment

  • President & CEO, Starfire Industries LLC, 2001 - present

Selected Articles in Journals

  • Alman, D.A., H. Qiu, T. Spila, K.C. Thompson, E.L. Antonsen, B.E. Jurczyk, D.N. Ruzic, "Characterization of collector optic material samples exposed to a DPP EUV light source", accepted in J. Microlithography, Microfabrication, and Microsystems, 2006.
  • Qiu, H., D.A. Alman, K.C. Thompson, J.B. Spencer, E.L. Antonsen, B.E. Jurczyk, D.N. Ruzic, T.P. Spila, "Characterization of collector optic material samples before and after exposure in laser produced plasma and discharge produced plasma EUV sources", accepted in J. Microlithography, Microfabrication, and Microsystems, 2006
  • Jaworski, M.A., B.E. Jurczyk, E.L. Antonsen, D.N. Ruzic, "Direct current magnetic insulation of an immersed RF antenna", Plasma Source Science and Technology 15, 474-478 (2006)
  • Antonsen, E.L., K.C. Thompson, M. R. Hendricks, D. A. Alman, B.E. Jurczyk, D.N. Ruzic, "Ion Debris Characterization form a Z-Pinch Extreme Ultraviolet Light Source", J. Appl.Phys., 99 063301 (2006)
  • Thompson, K.C., E. L. Antonsen, M.R. Hendricks, B.E. Jurczyk, M. Williams, D. N. Ruzic, "Experimental test chamber design for optics exposure testing and debris characterization of a xenon discharge produced plasma source for extreme ultraviolet lithography", Microelectronics Engineering, 83 (2006) 476-484.
  • Vargas-Lopez, E., B.E. Jurczyk, M. A. Jaworski, M. J. Neumann, D. N. Ruzic, "Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources", Microelectronics Engineering 77 (2005) 95-102.
  • Jurczyk, B.E., M. Vargas-Lopez, N. Neumann, D.N. Ruzic, "Illinois Debris-mitigation EUV Applications Laboratory (IDEAL)", Microelectronics Engineering 77 (2005) 103-109.

Articles in Conference Proceedings

  • Debris Characterization and Collector Material Lifetime for a Commercial Tin-based Z-pinch Extreme Ultraviolet Light Source, 5th International Symposium on EUV Lithography, San Diego, CA, Nov. 2005
  • Cleaning of Condensable Fuels from EUV Optics, 5th International Symposium on EUV Lithography, San Diego, CA Nov. 2005
  • Progress toward Sn DPP and LPP Solution: a Source-Collector perspective, 5th International Symposium on EUV Lithography, San Diego, CA, Nov. 2005
  • Plasma-Based Techniques to Reduce Particle Contamination, 30th SPIE Microlithography Conferences, San Jose CA, March 2005

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