5/11/2016 Susan Mumm, Editor
Written by Susan Mumm, Editor
The honor recognizes Peck’s work with plasma etching and PECVD of thin films. Peck is exploring the effects of introducing laser exposure to the plasma etching process, and has been able to activate etching in gas chemistries that normally do not etch, and enhance etch rates in recipes that do. He and his colleagues have studied standard materials of Si and SiO2, and have explored other material candidates with which the laser-enhanced etching would perform well, particularly metals.