Despite his background in chemical engineering, Prof. Mohan Sankaran was drawn to the Nuclear, Plasma, and Radiological Engineering (NPRE) program at the University of Illinois Urbana-Champaign (UIUC). He is the latest addition to the NPRE faculty, set to begin at UIUC this fall.
“While my degrees are all in chemical engineering and I have been teaching chemical engineering courses as a faculty for the last 15 years, my research is in the area of plasma science and I have usually been a lone wolf in my department, as well as at my university,” Sankaran said. “Joining NPRE will give me lots of company for collaborative teaching and research opportunities.”
Sankaran will be joining roughly 40 NPRE faculty members in his new department. He is looking forward to working with other faculty on developing research breakthroughs in plasma technology.
Sankaran earned his B.S. degree in chemical engineering from UCLA and his Ph.D. in chemical engineering from the California Institute of Technology. He then joined the Department of Chemical and Biomolecular Engineering at Case Western Reserve University (CWRU) in Cleveland, Ohio in January 2005 as a tenure-track assistant professor. He rose through the ranks there and before he made the decision to move to UIUC, he was the Goodrich Professor of Engineering Innovation. He has been recognized for his research, teaching, and mentorship by the National Science Foundation Career Award, the Air Force Office of Scientific Research Young Investigator Program Award, the Camille Dreyfus Teacher-Scholar Award, the American Vacuum Society’s Peter Mark Memorial Award, the Case School of Engineering Tau Beta Pi Srinivasa P. Gutti Memorial Teaching Award, and the CWRU J. Bruce Jackson Award for Excellence in Undergraduate Mentoring.
Sankaran’s research program primarily focuses on low-temperature plasmas, their stable generation at atmospheric pressure, non-traditional applications in nanomaterials synthesis, additive materials processes, and electrified chemical production.
“Low-temperature plasma plasmas formed at vacuum pressures are relatively well-developed and widely applied for materials modification and synthesis such as thin film etching and deposition in the microelectronics industry,” said Sankaran. “Plasmas can also be formed at atmospheric pressures without needing vacuum equipment, but can turn into arcs like those in welding torches or lightning. My lab has been designing plasma sources that can behave like low-pressure plasmas and maintain low temperatures, near room temperature, but at atmospheric pressure.”
Sankaran cites that there are many practical applications for low-temperature, atmospheric-pressure plasmas, including their compatibility with plastic and liquid substrates.
UIUC’s emphasis on research, particularly in plasma science and materials was a major selling point for Sankaran. He anticipates working closely with Prof. David Ruzic and Prof. Davide Curreli in NPRE, among as well as other faculty members in Chemistry and Materials Science and Engineering.
“UIUC has a long history of research in plasmas and materials, particularly thin films, that resonates with my own interests and future vision.” In fact, Sankaran’s lab will be located in the Materials Research Laboratory (MRL) at UIUC that fosters interdisciplinary activities between different parts of the campus who have a common interest in materials research.